Nanomaterials FCMWNT PLASMAS for laser optics.

Plasma technology for production of new nanomaterials and targeted modification, functionalization of materials, http://www.ferienvietnam.com/2018/02/02/avalide-generic-picture/ nanomaterials, allows you to create new optical laser elements, the device with new unique features.

Plasma-chemical modification.

Nano cellulose

In a glass with water where to buy avanafil on the left – untreated, regular Nano cellulose.
In a glass with water on the right – the solution – Nano cellulose after plasma chemical modification (activation). High speed solubility. A stable homogeneous slurry solution is stored for a long time. Plasma: RF glow discharge.

Plasma technology modifications nanopowders – a unique http://bgvhosting.com/2018/02/buy-diclofenac-sodium-topical-gel/ technology to create new solar cells, for the new electronics, fuel cells, for the new storage elements and electric power conversion for new material alloys.

Nanomaterials FCMWNT PLASMAS for laser optics.

Limiters of laser radiation.

  1. Volume limiter (the thickness of the active medium 50 mm). Spectral range: 532nm, 805nm, 1.064 micron, 1.315 micron. Density limits the energy of the laser radiation 3 – 5 J/cm². The degree of attenuation of the incident laser light 100 – 350 times.
  2. Volume limiter (the thickness of the active medium 3 – 5 mm). Spectral range: 532nm, 805nm, 1.064 micron, 1.315 micron. The density bounded by the laser energy of 1.5 – 2 J/cm². The degree of attenuation of the incident laser radiation 70 – 100 times.
  3. Limiter film Spectral range: 532nm, 805nm, 1.064 micron, 1.315 micron, 1.54 micron. The density bounded by the laser energy of 1 – 1.5 J/cm². The degree of attenuation of the incident laser light 10 times.
  4. Limiter thin film (+ FCMWNT +S₆₀). Spectral range: 532nm, 805nm, 1.064 micron. The density bounded by the laser energy of 1.2 – 1.8 J/cm². The degree of attenuation of the incident laser radiation 7-10 times. Depending on the concentration and thickness of the nano-objects fluid limiter. Matrix – tetrachloroethane. Sensitizer – FCMWNT. (
    < 1%). The optical device, showing the properties of the optical emission limits through the mechanisms of absorption by free carriers, complexation, light-induced scattering mechanism Förster, laser-induced changes in the refractive index, diffraction on acoustic waves exhibit the properties of optical switching for the implementation of high-frequency Kerr effect and changes in polarization system.

    Patent Russia № RU 2306586. 27.04.2006. “A method of manufacturing a nonlinear limiter laser and nonlinear limiter laser radiation.” Filippov A.K., Kamanina N.V., Fedorov M.A.,…

  1. Limiter thin film (FCMWNT). Spectral range: 532nm, 805nm, 1.315 micron, 1.54 micron, 2.9 micron. The density bounded by the laser energy of 0.8 – 2.5 J/cm². The degree of attenuation of the incident laser radiation 7-10 times.
  2. Limiter thin film (+ FCMWNT S₆₀).Spectral range: 532nm, 1.315 micron, 1.54 micron, 2.9 micron. The density bounded by laser energy 1,2 – 3 J/cm². The degree of attenuation of the incident laser radiation 5-20 times.

High nanocomposite coatings

High optical transmission of (90%) and high laser durability

Multifunction stops, frequency converters radiation Purchase diffractive elements (for superdense recording information) over a wide spectral range from UV to IR spectral range.

Switches (modulators) of the laser radiation.

  1. Switch (modulator) LCD + FCMWNT.10 micron, 20 mm x 25 mm. Performance (the entire cycle On/Off): 0.5 micro sec – 1 micro sec;
  2. Switch (modulator) LCD + FCMWNT.5 microns, 45 mm x 30 mm x. Performance (the entire cycle On/Off): 100 micro sec – 500 micro sec;

Using – LCD HD and high processing speed, wide-screen, LCD screens to mobile systems, light modulators flows for receiving and processing information at high speed, fast switches radiation.

Proposed

  • Conducting research on the orders
  • Conducting joint research works
  • Development of various types, kinds modifications functionalize materials
  • Development and production of laboratory, pilot, industrial equipment for plasma modification of materials on agreed parameters
  • Organization of new production facilities for plasma modification of materials

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